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Targets Dryness & Irritation, Sensitivity & Redness Advanced Technology Soothes, Softens & Strengthens Stressed Skin Key Ingredients: NAC Y2™, Ectoin, Centella Asiatica
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DESCRIPTION
This reformulated mask is engineered to care for and strengthen a visibly fatigued complexion, providing a targeted recovery treatment when needed most. Infused with advanced complexes, the formula works to visibly repair and rejuvenate the skin’s surface. It reinforces the moisture barrier and restores a healthy glow, ensuring the skin remains resilient and refreshed.
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Style: YTBM115